A new technology can rapidly produce low cost prototype circuits, and offer applications in the fields of medical diagnostics and optoelectronics.

Scientists from Northwestern University have developed a new method for fabricating designs on a nano-scale, called beam-pen lithography (BPL). Using this method, Northwestern’s team patterned 15,000 copies of the two iconic structures of the Chicago skyline-the Willis Tower and the John Hancock Center, simultaneously in just half an hour. BPL consists of a series of tiny pyramid-shaped pens that draw highly precise patterns using light on a light-sensitive material.

Scientists working on the technology say that it could be used to rapidly produce low cost prototype circuits, besides having applications in the fields of medical diagnostics and optoelectronics.

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